GaAs-Specific MOCVD System

MOCVD (Metal Organic Chemical Vapor Deposition) equipment is a key tool for preparing compound semiconductor thin layers, suitable for preparing various compound semiconductor materials, and can achieve highly uniform thin layer deposition. Widely used in fields such as solar cells, semiconductor lasers, LEDs, etc.

Advantages

· Develop single-chip epitaxial growth, compatible with 8-inch and 6-inch epitaxial wafers;
· By using precise zone temperature control technology, the temperature field inside the reaction chamber is made uniform and consistent;
· Innovative flow field control technology ensures stable laminar flow of process gas throughout the reaction chamber, improving the uniformity and consistency of the deposited film;
· The formula editing module interface ensures different material deposition requirements and provides support for the development of new material preparation for customers;
· Equipment maintenance is simple, adjusting equipment structure design makes periodic maintenance easier.